Sign in
121.6 nm radiation source for advanced lithography
Conference proceeding

121.6 nm radiation source for advanced lithography

Jianxun Yan, Ashraf El-Dakrouri, Mounir Laroussi and Mool C. Gupta
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol.20(6), pp.2574-2577
Papers from the 46th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
01/11/2002

Abstract

Metrics

1 Record Views

Details