Abstract
The effect of different arsenic species (As-2 or As-4) on the quality of molecular beam epitaxy (MBE) grown GaNAsSb materials (samples A and B) and GaAs/GaNAsSb/GaAs p(+) n(-) n(+) devices (samples C and D) were investigated. The improvement in material quality in sample B, as well as the improvement in diode and solar cell characteristics in sample C, may suggest a successful defect density manipulation using As-2 overpressure for GaNAsSb growth.