Abstract
The surface morphology of carbon thin films deposited at temperatures 20 degrees C and 300 degrees C have been done by Atomic Force Microscope (AFM). The 10,000 pulses of KrF Excimer laser of wavelength 248 rim, pulse energy 13-50 mJ and pulse width 20 ns was focused at an angle of 45 degrees to ablate pure graphite target. Silicon (111) was used as a substrate to deposit carbon thin film and placed at distance of 15 mm from the target surface. The whole experiment has been performed under vacuum approximate to 10(-4) Torr in stainless steel vacuum chamber. The nature of bonding of carbon thin films deposited at different temperatures has been done by using technique Fourier Infrared Transformation Spectroscopy (FTIR). Results obtained from AFM and FTIR support each other and explain the effect of substrate temperature on thin films deposition.