Co-doped TiO2 epitaxial thin films grown by sputtering

G. C Han; P Luo; Z. B Guo; FIAZ UN Nahar; M Tay; Y. H WU; S. J Wang

doi:10.1016/j.tsf.2005.10.055

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Co-doped TiO2 epitaxial thin films grown by sputtering

Conference proceeding

Peer reviewed

Co-doped TiO2 epitaxial thin films grown by sputtering

G. C Han, P Luo, Z. B Guo, FIAZ UN Nahar, M Tay, Y. H WU and S. J Wang

Thin solid films, Vol.505(1-2), pp.137-140

Proceedings of the International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium D: Magnetic nanomaterials and devices, Singapore, July 3-8, 2005

18/05/2006

DOI: https://doi.org/10.1016/j.tsf.2005.10.055

Abstract

Condensed matter: structure, mechanical and thermal properties

Cross-disciplinary physics: materials science; rheology

Defects and impurities in crystals; microstructure

Deposition by sputtering

Doping and impurity implantation in other materials

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

Structure of solids and liquids; crystallography

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Details

Title: Co-doped TiO2 epitaxial thin films grown by sputtering
Creators - without role: G. C Han - Data Storage Institute
P Luo - Data Storage Institute
Z. B Guo - Deep Space Industries
FIAZ UN Nahar - Data Storage Institute
M Tay - Data Storage Institute
Y. H WU - Data Storage Institute
S. J Wang - Institute of Materials Research and Engineering
Publication Details: Thin solid films, Vol.505(1-2), pp.137-140
Conference: Proceedings of the International Conference on Materials for Advanced Technologies (ICMAT 2005) Symposium D: Magnetic nanomaterials and devices, Singapore, July 3-8, 2005
Publisher: Elsevier Science
Identifiers: 9942507208331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Conference proceeding