Abstract
TiO2:ZnO nanostructures thin films have been fabricated on glass substrates via sol-gel spin-coating technique for deposition of TiO2 seed layer and solution-immersion method for growth of ZnO nanostructures. The layer of TiO2 were annealed at various temperatures ranging from 350 to 500 degrees C for 2 hours to examine the effect of annealing TiO2 seed on the growth of ZnO nanostructures. The surface topography of TiO2 seed layer were investigated by Atomic Force Microscope (AFM) and surface morphology of TiO2:ZnO nanostructures thin films were observed by Field Emission Scanning Electron Microscope (FESEM). The optical properties of TiO2 seed layer and TiO2:ZnO nanostructures thin films as a function of seed annealing were determined by Ultraviolet-Visible (UV-Vis) spectrophotometer. As the annealing temperature of the seed layer increase to 450 degrees C, the surface of the seed layer improved which causes the diameter size reduction of ZnO nanostructures and enhance the UV absorption properties and optical transmittance.