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Effect of oxygen pressure on the semiconductor properties of FTO thin films
Conference proceeding

Effect of oxygen pressure on the semiconductor properties of FTO thin films

Ali Hamieh, Jihad Hamieh, Ali Hamie, Ali Ghorayeb, Abdallah Zaiour and Bassam Assaf
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Conference Proceedings, p.1
01/01/2017

Abstract

Atomic structure Microelectronics Optical properties Oxygen Pressure effects Pulsed laser deposition Thin films Titanium

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