Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji; Borui Chen; Xie Zeng; Tania Moein; Haomin Song; Qiaoqiang Gan; Alexander Cartwright; IEEE

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Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Qiaoqiang Gan, Alexander Cartwright and IEEE

2015 Conference on Lasers and Electro-Optics (CLEO), Vol.2015-, pp.1-2

05/2015

Abstract

Fabrication

Films

Gratings

Lithography

Metals

Scanning electron microscopy

Surface treatment

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

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Title: Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography
Creators - without role: Dengxin Ji - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Borui Chen - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Xie Zeng - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Tania Moein - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Haomin Song - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Qiaoqiang Gan - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
Alexander Cartwright - Dept. of Electr. Eng., State Univ. of New York at Buffalo, Buffalo, NY, USA
IEEE
Publication Details: 2015 Conference on Lasers and Electro-Optics (CLEO), Vol.2015-, pp.1-2
Publisher: OSA
Identifiers: 9941833608331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Conference proceeding