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Nanoscale and device level analysis of the resistive switching phenomenon in ultra-thin high-k gate dielectrics
Conference proceeding

Nanoscale and device level analysis of the resistive switching phenomenon in ultra-thin high-k gate dielectrics

A Crespo-Yepes, J Martin-Martinez, V Iglesias, R Rodriguez, M Porti, M Nafria, X Aymerich and M Lanza
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Conference Proceedings, p.281
01/02/2013

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