Organic monolayers as resist layers for Cu deposition on Si (111) surfaces

Conference proceeding

Peer reviewed

E Balaur, Y Zhang, T Djenizian, R Boukherroub and P Schmuki

Journal of electroceramics, Vol.16(1), pp.71-77

Summer school on electrochemistry and nanotechnology

01/02/2006

Abstract

Chemistry

Electrochemistry

Electrodeposition

Exact sciences and technology

General and physical chemistry

Photochemistry

Physical chemistry of induced reactions (with radiations, particles and ultrasonics)

Study of interfaces

Surface physical chemistry

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Title: Organic monolayers as resist layers for Cu deposition on Si (111) surfaces
Creators - without role: E Balaur - Friedrich-Alexander-Universität Erlangen-Nürnberg
Y Zhang - Friedrich-Alexander-Universität Erlangen-Nürnberg
T Djenizian - Friedrich-Alexander-Universität Erlangen-Nürnberg
R Boukherroub - BP
P Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Journal of electroceramics, Vol.16(1), pp.71-77
Conference: Summer school on electrochemistry and nanotechnology
Publisher: Springer
Identifiers: 9936970208331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Conference proceeding