Silicon dissolution regimes from chemical vapour etching: from porous structures to silicon grooving

Conference proceeding

Peer reviewed

A BEN JABALLAH, M Saadoun, M Hajji, H Ezzaouia and B Bessaïs

Applied surface science, Vol.238(1-4), pp.199-203

APHYS2003

15/11/2004

Abstract

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Physics

Porous materials; granular materials

Specific materials

Surface cleaning, etching, patterning

Surface treatments

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Title: Silicon dissolution regimes from chemical vapour etching: from porous structures to silicon grooving
Creators - without role: A BEN JABALLAH - Research and Technology Center of Energy
M Saadoun - Research and Technology Center of Energy
M Hajji - Research and Technology Center of Energy
H Ezzaouia - Research and Technology Center of Energy
B Bessaïs - Research and Technology Center of Energy
Publication Details: Applied surface science, Vol.238(1-4), pp.199-203
Conference: APHYS2003
Publisher: Elsevier Science
Identifiers: 9916918108331
Academic Unit: Jazan University
Language: English
Resource Type: Conference proceeding