Structural and chemical properties of sputter-deposited Ti-Ge-N thin films

Conference proceeding

Peer reviewed

C. S Sandu, R Sanjines, M Benkahoul, M PARLINSKA-WOJTAN and F Levy

Surface & coatings technology, Vol.200(5-6), pp.1483-1488

Proceedings of the 32nd International Conference on Metallurgical Coatings and Thin Films, San Diego, California, May 2-6, 2005

21/11/2005

Abstract

Applied sciences

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Metals. Metallurgy

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Title: Structural and chemical properties of sputter-deposited Ti-Ge-N thin films
Creators - without role: C. S Sandu - École Polytechnique Fédérale de Lausanne
R Sanjines - École Polytechnique Fédérale de Lausanne
M Benkahoul - École Polytechnique Fédérale de Lausanne
M PARLINSKA-WOJTAN - École Polytechnique Fédérale de Lausanne
F Levy - École Polytechnique Fédérale de Lausanne
Publication Details: Surface & coatings technology, Vol.200(5-6), pp.1483-1488
Conference: Proceedings of the 32nd International Conference on Metallurgical Coatings and Thin Films, San Diego, California, May 2-6, 2005
Publisher: Elsevier
Identifiers: 9930269108331
Academic Unit: Taibah University
Language: English
Resource Type: Conference proceeding