Abstract
We have implemented a new high resolution imaging system independent of the image sensor's pixel size. This super-resolution is achieved by integrating a nano-aperture patterned in the first metal layer within the pixel using a standard CMOS process. The image sensor's focal plane is scanned with a sub-micron step to obtain the super-resolution image. To experimentally verify the operation of our technique, we have fabricated a standard 3-Transistors (3T) active pixel sensors with integrated nano-apertures in a 0.13 mu m CMOS technology. Here,we describe the concept of our super-resolution imaging and elaborate on our fabricated design and experimental setup.