Super absorbing nano-gap metasurface with sub-5-nm gaps for extreme light confinement

Dengxin Ji; Alec Cheney; Nan Zhang; Haomin Song; Jun Gao; Xie Zeng; Haifeng Hu; Suhua Jiang; Zongfu Yu; Qiaoqiang Gan; IEEE

Conference proceeding

Super absorbing nano-gap metasurface with sub-5-nm gaps for extreme light confinement

Dengxin Ji, Alec Cheney, Nan Zhang, Haomin Song, Jun Gao, Xie Zeng, Haifeng Hu, Suhua Jiang, Zongfu Yu, Qiaoqiang Gan, …

2018 Conference on Lasers and Electro-Optics (CLEO), pp.1-2

05/2018

Abstract

Absorption

Capacitance

Fabrication

Integrated circuit modeling

Mathematical model

Metamaterials

Numerical models

We report a metamaterial super absorber structure with sub-5-nm gaps fabricated using atomic layer deposition processes for extreme light confinement. Light trapping efficiency of 81% is experimentally demonstrated at mid-infrared wavelengths.

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Title: Super absorbing nano-gap metasurface with sub-5-nm gaps for extreme light confinement
Creators - without role: Dengxin Ji - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Alec Cheney - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Nan Zhang - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Haomin Song - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Jun Gao - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Xie Zeng - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Haifeng Hu - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Suhua Jiang - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Zongfu Yu - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
Qiaoqiang Gan - Department of Electrical Engineering, The State University ofNew York at Buffalo, Buffalo, NY 14260
IEEE
Publication Details: 2018 Conference on Lasers and Electro-Optics (CLEO), pp.1-2
Publisher: OSA
Identifiers: 9944058308331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Conference proceeding