Abstract
A wet-chemical process for depositing and patterning RuO2 contacts for use in ferroelectric thin film capacitive devices is described, Three new ruthenium compounds containing photocrosslinkable organic groups have been synthesized which polymerize upon UV exposure. Preliminary pattern forming ability of the new precursors has been tested with the use of a simple straight line contact mask. The exposed portions of the precursor films are resistant to ethanol, acetone, and light abrasion. The formation of crystalline RuO2 upon organic pyrolysis was confirmed by x-ray diffraction. Synthesized ruthenium complexes were compared to commercially available ruthenium acetylacetonate. The synthesized organo-ruthenium complexes showed improvement in pattern resolution and clarity.