Using neural networks to control the process of plasma etching and deposition

Conference proceeding

G Erten, A Gharbi, F Salam, T Grotjohn, J Asmussen and IEEE

ICNN - 1996 IEEE INTERNATIONAL CONFERENCE ON NEURAL NETWORKS, VOLS. 1-4, pp.1091-1096

01/01/1996

Abstract

Computer Science

Computer Science, Artificial Intelligence

Science & Technology

Technology

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Title: Using neural networks to control the process of plasma etching and deposition
Creators - without role: G Erten
A Gharbi
F Salam
T Grotjohn
J Asmussen
IEEE
Publication Details: ICNN - 1996 IEEE INTERNATIONAL CONFERENCE ON NEURAL NETWORKS, VOLS. 1-4, pp.1091-1096
Publisher: IEEE
Number of pages: 6
Identifiers: 9951491708331
Academic Unit: King Saud University
Language: English
Resource Type: Conference proceeding