A method for the diffractive microrelief formation using the layered photoresist growth: Computer optics in Russia

$A method for the diffractive microrelief formation using the layered photoresist growth: Computer optics in Russia$

Journal article

Peer reviewed

A. V Volkov, N. L Kazanskiy, O. Ju Moiseyev and V. A Soifer

Optics and lasers in engineering, Vol.29(4-5), pp.281-288

1998

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Title: A method for the diffractive microrelief formation using the layered photoresist growth
Creators - without role: A. V Volkov - Image Processing Systems Institute
N. L Kazanskiy - Image Processing Systems Institute
O. Ju Moiseyev - Image Processing Systems Institute
V. A Soifer - Image Processing Systems Institute
Publication Details: Optics and lasers in engineering, Vol.29(4-5), pp.281-288
Publisher: Elsevier
Identifiers: 9941896608331
Academic Unit: King Abdullah University of Science & Technology
Language: Russian
Resource Type: Journal article