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A new parameter to characterize the charge transport regime in Ni/HfO2/Si-n+-based RRAMs
Journal article   Peer reviewed

A new parameter to characterize the charge transport regime in Ni/HfO2/Si-n+-based RRAMs

M.A. Villena, J.B. Roldán, M.B. González, P. González-Rodelas, F. Jiménez-Molinos, F. Campabadal and D. Barrera
Solid-state electronics, Vol.118, pp.56-60
04/2016

Abstract

Conductive filaments Parameter extraction Resistive switching memory RRAM variability Simulation tools

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