Sign in
A novel stochastic photo-thermoelasticity model according to a diffusion interaction processes of excited semiconductor medium
Journal article   Open access  Peer reviewed

A novel stochastic photo-thermoelasticity model according to a diffusion interaction processes of excited semiconductor medium

Kh Lotfy, Abdelaala Ahmed, A. El-Bary, Abdelhafeez El-Shekhipy and Ramdan S. Tantawi
European physical journal plus, Vol.137(8), pp.972-972
27/08/2022
PMID: 36060103

Abstract

Regular
url
https://doi.org/10.1140/epjp/s13360-022-03185-6View
Published (Version of record) Open

Metrics

1 Record Views

Details