Abstract
Thermal evaporation technique was used to deposit 263 nm of TiO2 films on a quartz substrate. XRD of powder TiO2 reveals anatase phase characterized by nanostructure with crystallite size within a range of 4-10 nm. The increase in annealing temperature (400-800 degrees C) increases the crystallite size up to 43.1 nm. SEM micrograph shows grains of annealed TiO2 films within nanoscale. Optical gap, refractive index, dielectric constants, porosity, ratio of carrier concentration to the effective mass, dispersion, and oscillation energy were determined as well as optical conductivity and energy loss function. All parameters are affected by annealing. Current theoretical ideas were used to discuss the obtained results.