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Al0.65Ga0.35N/Al0.4Ga0.6N Micro-Channel Heterojunction Field Effect Transistors With Current Density Over 900 mA/mm
Journal article   Peer reviewed

Al0.65Ga0.35N/Al0.4Ga0.6N Micro-Channel Heterojunction Field Effect Transistors With Current Density Over 900 mA/mm

Hao Xue, Kamal Hussain, Towhidur Razzak, Mikhail Gaevski, Shahadat Hasan Sohel, Shahab Mollah, Vishank Talesara, Asif Khan, Siddharth Rajan and Wu Lu
IEEE electron device letters, Vol.41(5), pp.677-680
05/2020

Abstract

Aluminum gallium nitride Current density HEMTs Logic gates MODFETs Radio frequency RF transistor ultra-wide band gap

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