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Amorphization of silicon by ion irradiation in dense plasma focus
Journal article   Peer reviewed

Amorphization of silicon by ion irradiation in dense plasma focus

Mehboob Sadiq, M. Shafiq, A. Waheed, R. Ahmad and M. Zakaullah
Physics letters. A, Vol.352(1), pp.150-154
20/03/2006
DOI: https://doi.org/10.1016/j.physleta.2005.11.058

Abstract

78.30.-j 52.58.Lq 52.77.Dq 81.05.Gc
Amorphization of crystalline silicon is achieved by irradiation of energetic argon ions generated in the dense plasma focus. Raman spectroscopy and X-ray diffraction of crystalline and irradiated samples show that crystalline silicon transforms into completely disordered structure through polycrystalline and amorphous phases on increasing the implanted dose.

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