Abstract
Stress induced in [100] oriented Si circular micropillars by coatings of low pressure chemical vapor deposited B-10, SiyNx, and plasma enhanced chemical vapor deposited SiO2 were measured using micro-Raman spectroscopy. Both tensile and compressive strains in the Si micropillars were observed. Exceptionally large stresses were found to exist in some of the measured Si micropillars. The cross-sectional shapes of these structures were shown to be an important factor in correlating their strain concentrations which could fracture the micropillar. (C) 2013 American Vacuum Society.