Analysis of the Drude model in metallic films

H Y Li; S M Zhou; J Li; Y L Chen; S Y Wang; Z C Shen; L Y Chen; H Liu; X X Zhang

doi:10.1364/AO.40.006307

Back

Analysis of the Drude model in metallic films

Journal article

Peer reviewed

Analysis of the Drude model in metallic films

H Y Li, S M Zhou, J Li, Y L Chen, S Y Wang, Z C Shen, L Y Chen, H Liu and X X Zhang

Applied optics (2004), Vol.40(34), pp.6307-6311

01/12/2001

DOI: https://doi.org/10.1364/AO.40.006307

PMID: 18364937

Abstract

Optics

Physical Sciences

Science & Technology

A method, believed to be new, to simulate Drude parameters for collective oscillation of the free carriers in metallic films is proposed. Plasma resonance frequency and relaxation were simulated simultaneously from both the real and the imaginary parts of the dielectric function of a metallic film after consideration of their correlation in the Drude model. As examples, the contributions of the electrons in Ag films and of the free carriers in metallic silicide, NbSi2, and TaSi2, films have been studied. (C) 2001 Optical Society of America.

Metrics

1 Record Views

Details

Title: Analysis of the Drude model in metallic films
Creators - without role: H Y Li - Hong Kong University of Science and Technology
S M Zhou - Hong Kong University of Science and Technology
J Li - Hong Kong University of Science and Technology
Y L Chen - Hong Kong University of Science and Technology
S Y Wang - Hong Kong University of Science and Technology
Z C Shen - Hong Kong University of Science and Technology
L Y Chen - Hong Kong University of Science and Technology
H Liu - Hong Kong University of Science and Technology
X X Zhang - Hong Kong University of Science and Technology
Publication Details: Applied optics (2004), Vol.40(34), pp.6307-6311
Publisher: Optical Soc Amer
Number of pages: 5
Identifiers: 9941897908331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article