Abstract
The influence of two silver contents (2% and 4%) on NiO films were studied in terms of structural and optical properties. Ag doped NiO films were grown on glass and n-type silicon substrates heated at 400 degrees C by chemical pyrolysis method. Optical transmission measurements showed up to 60% transparency in the visible area for undoped NiO and decreased with increasing Ag content. X-ray diffraction assures the existence of epitaxial growth with the c-axis. Average particle size, surface roughness and energy gap were decreased also. Rectifying characteristics of junctions deposited films on n-type silicon has been analyzed. Transparent conductive films showed excellent properties to be adopted for solar cells and optical sensors.