Abstract
Self assembled InGaAs/GaAs quantum dots (QD) have a great potential for high performance optoelectronic devices such as low threshold laser diodes, infrared detectors, modulators, memories. In order to characterize the behavior of the QD system, we use two p(+)-n structures grown epitaxially on GaAs under similar conditions. The first structure acts as reference while in the second structure a single QD self-assembled layer is introduced in the middle of the n-GaAs matrix layer. The structure is designed such that for OV applied bias the QD layer lies outside the depleted region. When the reverse bias is increased, the charge from the QD system is removed and the depletion layer moves further into the GaAs matrix material. The electronic structure of the QD is investigated using two methods: photoluminescence, in order to characterize the transition energies between electron and hole levels in the QD system and capacitance spectroscopy in order to study the electron levels in the conduction band only. In addition, admittance spectroscopy spectra are measured in order to characterize the carrier transport mechanism. There is no evident step in the capacitance versus frequency behavior at room temperature in the range 1 Hz-1 MHz, indicating a large carrier cross section caption and/or a low activation energy for the carrier transport between the dot system and the wetting layer and GaAs barriers. The plateau in the C-V behavior, due to charging or discharging of the QD system is modeled using the solution of a Poisson equation and the resulting energy of the electron states within the conduction band and QD size distribution are correlated with results from photoluminescence studies, which involve transitions between energy levels both from the conduction and valence bands.