Characterization of rapid thermal oxidation of AlAs on GaAs/AlGaAs structure

Journal article

Peer reviewed

S. L. Ng, B. S. Ooi, Y. L. Lam, Y. C. Chan, Y. Zhou and S. Buddhudu

Surface and interface analysis, Vol.29(1), pp.33-37

01/2000

Abstract

AlAs

atomic force microscopy

energy-dispersive x-ray imaging

oxidation

Raman spectroscopy

surface segregation

thermal diffusion

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Title: Characterization of rapid thermal oxidation of AlAs on GaAs/AlGaAs structure
Creators - without role: S. L. Ng - Nanyang Technological University
B. S. Ooi - Nanyang Technological University
Y. L. Lam - Nanyang Technological University
Y. C. Chan - Nanyang Technological University
Y. Zhou - Nanyang Technological University
S. Buddhudu - Nanyang Technological University
Publication Details: Surface and interface analysis, Vol.29(1), pp.33-37
Publisher: John Wiley & Sons, Ltd
Number of pages: 5
Identifiers: 9943503008331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article