Abstract
In recent past 2D metal trihalides have evolved as useful gapless semiconductor due to their physical properties like low dimensional magnetism and thermo electric performance. Such highly appreciable physical properties of these material are because enormous natural properties like half-metallicity, polarization, spin-orbit coupling impacts, layered structure and low cost. Layered formation of these materials provides an opportunity for the field of mathematical chemistry for identification of patterns and computation of mathematical properties. This article is dedicated to compute vertex-edge-degree based topological characterization of 2D trihalides. General mathematical expressions of several vertex-edge-degree based topological indices are presented in terms of research outcomes so they can be effectively used in future industrial projects.