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Copper Ion Cementation in Presence of a Magnetic Field
Journal article   Peer reviewed

Copper Ion Cementation in Presence of a Magnetic Field

Olfat A. Fadali, Mohamed Obaid, Mohamed S. Mahmoud, Taha E. Farrag, Kim TaeWoo, Khalil Abdelrazek Khalil and Nasser A. M. Barakat
Chemical engineering & technology, Vol.38(3), pp.441-445
03/2015

Abstract

Engineering Engineering, Chemical Science & Technology Technology

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