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Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching
Journal article   Peer reviewed

Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching

Besma Moumni and Abdelkader Ben Jaballah
Applied surface science, Vol.425, pp.1-7
15/12/2017

Abstract

Chemistry Chemistry, Physical Materials Science Materials Science, Coatings & Films Physical Sciences Physics Physics, Applied Physics, Condensed Matter Science & Technology Technology

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