Abstract
The domain boundary in Ce-alpha-SiAlON is a very special structural feature in this family of rare-earth doped alpha-SiAlON materials. TEM was used to characterise the structure of these domain boundaries, revealing the formation of enlarged structural interstices at the boundary regions. Segregation of cerium ions at these interstices was confirmed by EDS analysis. Thus, alpha-SiAlON doped with large cerium ions was stabilised via the formation of domain boundaries. The chemical valences of the incorporated cerium ions were also evaluated by EELS. 4 refs.