Abstract
The decomposition of chemical warfare agent simulant, dimethyl methylphophonate (DMMP) vapor, was investigated on an ultrathin film titania (TiO2) photocatalytic light absorber. The light absorber contains an aluminum (Al) reflector and the TiO2 thin film with different thicknesses, sequentially deposited on a supportive glass substrate. The designed structure constructs a nanocavity that exhibits strong light absorption within the photocatalytic TiO2 ultrathin film. Thus, the intrinsic trade-off between optical absorption and charge carrier extraction efficiency, i.e., a light absorber should be thick enough to absorb the light allowable by its band gap but thin enough to allow charge carrier extraction for catalytic reactions, is conquered. The TiO2/Al light absorber significantly boosted TiO2 photocatalytic activity compared to the benchmark Aeroxide®P25 catalyst (i.e., up to 2013 times increase in reaction rate). The effects of reactant (i.e. DMMP, water and oxygen, respectively) partial pressure and reaction temperature on photocatalytic decomposition of DMMP by the ultrathin-film TiO2 photocatalytic light absorber were studied. Kinetic data of the DMMP decomposition can be described by the Langmuir-Hinshelwood model.
•Photocatalytic decomposition of DMMP vapor was studied on thin film TiO2 UFPLA.•Light absorption boosted by UFPLA promotes catalytic activity of TiO2 thin films.•DMMP decomposition rate is increased >2000 times compared to that on Aeroxide®P25.•Kinetic data of DMMP decomposition is described by Langmuir-Hinshelwood model.