Defect-Free AFM Scratching at the Si/SiO[sub 2] Interface Used for Selective Electrodeposition of Nanowires

Journal article

J. Michler, R. Gassilloud, Ph Gasser, L. Santinacci and P. Schmuki

Electrochemical and solid-state letters, Vol.7(3), p.A41

2004

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Title: Defect-Free AFM Scratching at the Si/SiO[sub 2] Interface Used for Selective Electrodeposition of Nanowires
Creators - without role: J. Michler - Swiss Federal Laboratories for Materials Science and Technology
R. Gassilloud - Swiss Federal Laboratories for Materials Science and Technology
Ph Gasser - Swiss Federal Laboratories for Materials Science and Technology
L. Santinacci - Friedrich-Alexander-Universität Erlangen-Nürnberg
P. Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Electrochemical and solid-state letters, Vol.7(3), p.A41
Identifiers: 9935192708331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article