Abstract
Metal/insulator/semiconductor solar cells on single-crystal and polycrystalline silicon substrates have been fabricated under various electrode metal (chromium) deposition rates. The effects of deposition rate on the electrical, structural and compositional characteristics of the resulting films have been studied. Auger electron spectroscopy and transmission electron microscopy results correlate well with the electrical characterization of the resulting devices. It is found that the oxygen content, which is inversely proportional to the rate of metal deposition, determines the structure of the resulting metal films which can be amorphous or polycrystalline. The oxygen content also has a beneficial effect on the performance of the solar cells by inducing a reduction in the electrode metal (chromium) work function.