Effect of RF Plasma Power and Deposition Temperature on the Surface Properties of Tin Oxide Deposited by Modified Plasma Enhanced Chemical Vapor Deposition

Journal article

S. G. Ansari, M. A. Dar, Z. A. Ansari, Hyung Kee Seo, Young-Soon Kim, A. Al-Hajry and Hyung-Shik Shin

Science of advanced materials, Vol.1(3), pp.254-261

01/12/2009

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Title: Effect of RF Plasma Power and Deposition Temperature on the Surface Properties of Tin Oxide Deposited by Modified Plasma Enhanced Chemical Vapor Deposition
Creators - without role: S. G. Ansari
M. A. Dar
Z. A. Ansari
Hyung Kee Seo
Young-Soon Kim
A. Al-Hajry
Hyung-Shik Shin
Publication Details: Science of advanced materials, Vol.1(3), pp.254-261
Identifiers: 9924560508331
Academic Unit: Najran University
Language: English
Resource Type: Journal article