Abstract
Aluminum oxide thin films attract research interest due to their properties. Aluminum acetate was used as an Al source with acetic acid, oxalic acid, and nitric acid as additives. The transmittance and the thickness of the films strongly depend on the additives, with the approximate bandgap energy changing from 5 ev to 5.4 ev. The aluminum oxide film deposited by dip-coating is presented great uniform surface morphology. The knowledge of the degradation kinetics of materials is essential for investigating the thermal stability of compounds. The acetic acid thin film proved to be the most efficient additive by demonstrating interesting optoelectronic properties. The thin films deposited by dip-coating were characterized by using X-ray grazing incidence diffraction, SEM, UV-Visible spectroscopy. Gamma aluminum oxide thin films prepared by acetic acid can be a good candidate for a wide range of optical applications.