Abstract
Thin (50-1500 A) polycrystalline films of Cr by vacuum (10 exp --8 torr) were prepared by evaporation methods using the deposition rate on Corning glass 7059 and its temperature as experimental parameters. Electrical resistivity ( rho ) of these films has been studied in situ as a function of temperature (T), film thickness (t), and the above preparation variables. The films exhibit well-defined anomalies at the Neel temperature which is strongly dominated by internal stresses. The rho vs. T curves are briefly compared with those of other investigators. 13 ref.--AA