Abstract
ZnO 1- x S x thin films with 0≤ x ≤0.5 were deposited by electrochemical deposition from acidic solutions containing ZnCl 2 and Na 2 S 2 O 3 of different concentrations. The as-deposited films are of thicknesses around 0.5 µm. We used a new pulse form for deposition, i.e., the three-step pulse. The sulfur content increases with increasing concentration of Na 2 S 2 O 3 at low concentration range. Further increase in Na 2 S 2 O 3 concentration results in decrease in the sulfur content due to the formation of the sulfur colloids. A decrease in the bandgap energy with increasing sulfur content x was obtained. The bandgap bowing parameter was found to be about 4 eV.