Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)

Journal article

Peer reviewed

T Djenizian, B Petite, L Santinacci and P Schmuki

Electrochimica acta, Vol.47(6), pp.891-897

14/12/2001

Abstract

Applied sciences

Chemistry

Electrochemistry

Electrodeposition

Electronics

Exact sciences and technology

General and physical chemistry

Microelectronic fabrication (materials and surfaces technology)

Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

Study of interfaces

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Title: Electron-beam induced carbon deposition used as a mask for cadmium sulfide deposition on Si(100)
Creators - without role: T Djenizian - Friedrich-Alexander-Universität Erlangen-Nürnberg
B Petite - Friedrich-Alexander-Universität Erlangen-Nürnberg
L Santinacci - Friedrich-Alexander-Universität Erlangen-Nürnberg
P Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Electrochimica acta, Vol.47(6), pp.891-897
Publisher: Elsevier
Identifiers: 9934488608331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article