Electron beam induced carbon deposition used as a negative resist for selective porous silicon formation

Journal article

Peer reviewed

T Djenizian, L Santinacci, H Hildebrand and P Schmuki

Surface science, Vol.524(1-3), pp.40-48

01/02/2003

Abstract

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Physics

Surface treatments

1 Record Views

Title: Electron beam induced carbon deposition used as a negative resist for selective porous silicon formation
Creators - without role: T Djenizian - Friedrich-Alexander-Universität Erlangen-Nürnberg
L Santinacci - Friedrich-Alexander-Universität Erlangen-Nürnberg
H Hildebrand - Friedrich-Alexander-Universität Erlangen-Nürnberg
P Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Surface science, Vol.524(1-3), pp.40-48
Publisher: Elsevier Science
Identifiers: 9934515108331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article