Electron-beam induced nanomasking for metal electrodeposition on semiconductor surfaces

Journal article

Peer reviewed

T Djenizian, L Santinacci and P Schmuki

Journal of the Electrochemical Society, Vol.148(3), pp.C197-C202

01/03/2001

Abstract

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Ion and electron beam-assisted deposition; ion plating

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

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Title: Electron-beam induced nanomasking for metal electrodeposition on semiconductor surfaces
Creators - without role: T Djenizian - Friedrich-Alexander-Universität Erlangen-Nürnberg
L Santinacci - Friedrich-Alexander-Universität Erlangen-Nürnberg
P Schmuki - Friedrich-Alexander-Universität Erlangen-Nürnberg
Publication Details: Journal of the Electrochemical Society, Vol.148(3), pp.C197-C202
Publisher: Electrochemical Society
Identifiers: 9935045408331
Academic Unit: King Abdulaziz University
Language: English
Resource Type: Journal article