Abstract
•CMTN crystals have been prepared by a slow solvent evaporation method.•The melting point of the CMTN is 152.5 °C.•The SHG efficiency of CMTN was found to be 5 times that of KDP.•The UV cut off wavelength was found to be 335 nm.•The surface analysis was done by etching studies.
The present study deals with the synthesis and characterization of cadmium mercury thiocyanate bis(N-methyl formamide) or CMTN crystals where they were grown in two critical steps. In the first step, cadmium mercury thiocyanate (CMTC) single crystals were grown by intriguing cadmium chloride, mercuric chloride, and ammonium thiocyanate in 1:1:4 ratio and mixed with solvent by a slow solvent evaporation technique. The second step involves the reaction between CMTC and N-methyl formamide (NMF) in a 1:2 ratio leading to the formation of CMTN crystals. The growth parameters of CMTN grown crystals were optimized at different pHs (1- 5) and the solubility curve has also been reported. On characterization, the orthorhombic crystallinity having Pna21 space group of as-grown CMTN crystals has been revealed by single X-ray diffraction analysis (XRD) and the lattice cell parameters are found to be a = 15.195 Å, b = 7.722Å, c = 16.162 Å, and α = β = γ = 90°. Single the phase crystallinity of CMTN is observed by powder XRD pattern and the increase in the intensity of index peaks shows that there exists good coordination between the CMTC and NMF compounds. The FTIR analysis supported the presence of surface ligands groups of thiocyanate, while the Raman spectroscopy confirmed for the coordination of thiocyanate ions in the CMTN compound and thus both established for the metal-ligand bonding. The UV-vis spectroscopy showed the optical transparency of CMTN to have the cutoff wavelength at 335 nm and the Kurtz powder method for studying the second harmonic generation (SHG) output power is 5 times higher than the reference. Further increase of dielectric constant and dielectric loss with respect to the changes in frequency makes it a suitable material for the construction of photonic and non-linear optical (NLO) devices.