Abstract
In this paper, an experimental study of hot spots in gold/dielectric films using photoemission electron microscopy is reported. This technique allows a characterization of the statistical optical properties with unprecedented accuracy in the 800- to 1040-nm range. Theoretical predictions of the scaling theory on the number and intensity wavelength dependences of hot spots in the near-infrared are confirmed. Statistical properties of the intensity distribution, spectral behavior, and spatial localization of the hot spots are reported.