Extraordinary hall effect in (Ni80Fe20)x(SiO2)1-x thin films

Journal article

HUI Liu, FUK KAY Lee, RONG KUN Zheng, X. X Zhang and Ophelia K. C Tsui

Physical review. B, Condensed matter and materials physics, Vol.70(22), pp.224431.1-224431.8

12/2004

Abstract

Condensed matter: electronic structure, electrical, magnetic, and optical properties

Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures

Electronic transport in interface structures

Exact sciences and technology

Physics

Quantum hall effect (including fractional)

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Title: Extraordinary hall effect in (Ni80Fe20)x(SiO2)1-x thin films
Creators - without role: HUI Liu - Hong Kong University of Science and Technology
FUK KAY Lee - Hong Kong University of Science and Technology
RONG KUN Zheng - Hong Kong University of Science and Technology
X. X Zhang - Hong Kong University of Science and Technology
Ophelia K. C Tsui - Hong Kong University of Science and Technology
Publication Details: Physical review. B, Condensed matter and materials physics, Vol.70(22), pp.224431.1-224431.8
Publisher: American Physical Society
Identifiers: 9942327208331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article