Fabrication of v-groove gratings in InP by inductively coupled plasma etching with SiCl4/Ar

Journal article

Peer reviewed

K Kennedy, K. M Groom and R. A Hogg

Semiconductor science and technology, Vol.21(1), pp.L1-L5

2006

Abstract

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Physics

Surface treatments

1 Record Views

Title: Fabrication of v-groove gratings in InP by inductively coupled plasma etching with SiCl4/Ar
Creators - without role: K Kennedy - University of Sheffield
K. M Groom - University of Sheffield
R. A Hogg - University of Sheffield
Publication Details: Semiconductor science and technology, Vol.21(1), pp.L1-L5
Publisher: Institute of Physics
Identifiers: 9943021308331
Academic Unit: King Abdullah University of Science & Technology
Language: English
Resource Type: Journal article