Abstract
hoto-degradation of ethidium bromide. The CoS2-SiO2/Chitosan nanocomposites photocatalyst show In the present work, The SiO2, and CoS2-SiO2 nanomaterials and incorporated on chitosan was developed as photocatalyst for photocatalytic degradation of toxic compound such as ethidium bromide as a hazard mutagenic pollutant. The SiO2, and CoS2-SiO2 nanomaterials were prepared using the sol-gel/sonochemical method. Therefore, the nano photocatalyst were characterized by various analytical devices such as scanning electron microscopy (SEM), X-ray diffraction and photoelectron (XRD and XPS) analysis, energy dispersive X-ray spectrometer (EDS), UV-Vis absorption spectroscopy and dynamic light scattering, in order to attain the structural properties. The average crystallite size values of SiO2, CoS2-SiO2, and CoS2-SiO2/Chitosan nanocomposites are 0.63, 40.28, and 69.75nm, respectively. The band-gap values was obtained 8.9-2.7eV for SiO2, CoS2-SiO2, and CoS2-SiO2/Chitosan nanocomposites, respectively. The photocatalytic performances of the three prepared nano-photocatalyst were examined by UV-light with help the ps the high amount of photocatalytic degradation (96.00%) in comparison to SiO2, and CoS2-SiO2 nanomaterials. The results demonstrated that the all prepared nano-photocatalyst under UV irradiation was in pH 5at 40min. The antifungal and antibacterial of the SiO2, CoS2-SiO2, and CoS2-SiO2/Chitosan were examined. The CoS2-SiO2/Chitosan (high 11.00mm inhibition zone) has appropriate antimicrobial activity compared with pure SiO2.