Abstract
Thin films of Rhodamine-6G were fabricated with different thicknesses by utilizing the spin-coating technique. The used substrate was the Fluorine-doped tin oxide (FTO) for deposition the studied films on it. The technique of X-ray diffraction (XRD) was applied to detect the structural properties of the investigating Rhodamine-6G/FTO thin films. The analysis of Rhodamine 6G/FTO film surface morphology was achieved by the aid of the atomic force microscopy (AFM) technique. Spectral distribution of transmittance, reflectance, and absorbance in the wavelength range (300-2500 nm) was used to explore both of linear properties in addition to the nonlinear optical characteristics of Rhodamine-6G/FTO. All the investigated samples appeared to have an indirect allowed transition. The parts of the complex dielectric constants, real and imaginary parts, were specified. Further, the third-order nonlinear susceptibility (chi((3))) and the nonlinear refractive index (n(2)) were estimated. The optical limiting was examined using laser; He-Ne of 632.8 nm and solid-state green of 533 nm. It was found that the normalized power increased with decreasing the thickness of the Rhodamine 6G/FTO thin films. Rhodamine 6G/FTO is a promising optical system for optoelectronic applications.