Abstract
We have demonstrated directed self-assembly of poly(styrene-b-dimethylsiloxiane) (PS-b-PDMS) down to sub-10-nm half-pitch by using grating Si substrate coated with PDMS. The strong segregation between PS and PDMS enables us to direct the self-assembly in wide grooves of the grating substrate up to 500 nm in width. This process can be applied to form various type of sub-10-nm stripe pattern along variety of grating shape. (C) 2010 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 2297-2301, 2010