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Frequency-dependent dielectric response of HfTaOx-based metal-insulator-metal capacitors
Journal article   Peer reviewed

Frequency-dependent dielectric response of HfTaOx-based metal-insulator-metal capacitors

M. K. Hota, C. K. Sarkar and C. K. Maiti
Semiconductor science and technology, Vol.27(8)
01/08/2012

Abstract

Engineering Engineering, Electrical & Electronic Materials Science Materials Science, Multidisciplinary Physical Sciences Physics Physics, Condensed Matter Science & Technology Technology

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