Growth kinetics of diamond film with bias enhanced nucleation and H2/CH4/Ar mixture in a hot-filament chemical vapor deposition system

Journal article

Peer reviewed

S. G Ansari, TRAN LAN Anh, Hyung-Kee Seo, Kim-Gil Sung, Dar Mushtaq and Hyung-Shik Shin

Journal of crystal growth, Vol.265(3-4), pp.563-570

01/05/2004

Abstract

Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Cross-disciplinary physics: materials science; rheology

Exact sciences and technology

Materials science

Methods of deposition of films and coatings; film growth and epitaxy

Physics

Theory and models of film growth

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Title: Growth kinetics of diamond film with bias enhanced nucleation and H2/CH4/Ar mixture in a hot-filament chemical vapor deposition system
Creators - without role: S. G Ansari - Jeonbuk National University
TRAN LAN Anh - Jeonbuk National University
Hyung-Kee Seo - Jeonbuk National University
Kim-Gil Sung - Jeonbuk National University
Dar Mushtaq - Jeonbuk National University
Hyung-Shik Shin - Jeonbuk National University
Publication Details: Journal of crystal growth, Vol.265(3-4), pp.563-570
Publisher: Elsevier
Identifiers: 9946472708331
Academic Unit: King Saud University
Language: English
Resource Type: Journal article