Sign in
Growth of High-Quality In$_{0.4}$Ga$_{0.6}$N Film on Si Substrate by Metal Organic Chemical Vapor Deposition
Journal article   Peer reviewed

Growth of High-Quality In$_{0.4}$Ga$_{0.6}$N Film on Si Substrate by Metal Organic Chemical Vapor Deposition

Binh-Tinh Tran, Edward-Yi Chang, Kung-Liang Lin, Yuen-Yee Wong, Kartika Chandra Sahoo, Hsiao-Yu Lin, Man-Chi Huang, Hong-Quan Nguyen, Ching-Ting Lee and Hai-Dang Trinh
Applied physics express, Vol.4(11), p.115501
11/2011

Metrics

1 Record Views

Details